13.5nm, 25.4mm Dia, 5° AOI, EUV Flat Mirror

Product Family Description

• Maximum Achievable Reflection at 13.5nm
• Designed for EUV Beam Steering and Harmonic Separation
• 5° and 45° AOI Versions Available

Extreme Ultraviolet (EUV) Flat Mirrors are multilayer mirrors designed for maximum achievable reflectance at the design wavelength and angle of incidence. These mirrors feature a coating deposited on a super-polished single crystal silicon substrate and surface roughness less than 3Å RMS. The 45° AOI mirrors are useful for steering s-polarized beams, while the 5° AOI mirrors may be used with unpolarized beams. Applications for EUV mirrors include Coherent Diffractive Imaging (CDI) and materials science research. Extreme Ultraviolet (EUV) Flat Mirrors can also serve as harmonic selectors for High Harmonic Generation (HHG) beams.

Note: Test data from each mirror's production run sample included.