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Coherent® LightSmyth™ Nanopatterned Silicon Stamps

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  • Nanoscale-Textured Grooved Surfaces
  • Variable Groove Period and Groove Depth
  • Ideal for Nanophotonics Research Applications

Common Specifications

Construction:
RIE Grating
Thickness (mm):
0.68 ±0.05
Coating:
Uncoated
Substrate:
Single Crystal Silicon
Surface Quality:
60-40 (within CA)

Products

 Period (nm)   Dimensions (mm)   Compare   Stock Number   Price  Buy
855 12.50 x 12.50
855 25.00 x 25.00
139 12.50 x 12.50
139 25.00 x 25.00

Product Details

Coherent® LightSmyth™ Nanopattern Silicon Stamps consist of nanoscale-textured surfaces patterned on single-crystal silicon substrates. Through reactive ion etching, linear grooves with a trapezoidal cross-section are etched into the substrate surface, resembling conventional gratings. The etching process enables different period and depth specifications for these grooves, as well as more complex patterns such as lattices. Coherent® LightSmyth™ Nanopattern Silicon Stamps are ideal for nanophotonics research applications in the fields of optics and photonics, biology, chemistry, nanoimprinting, and microfluidics.

Note: II-VI Incorporated is now Coherent Corp.

Technical Information

SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Top Down)
SEM Image of 855nm, 200nm Groove Depth Linear Silicon Nanostamps (Top Down)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Cross Section)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Top Down)
SEM Image of 139nm, 50nm Groove Depth Linear Silicon Nanostamps (Top Down)

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