UltraFast Innovations (UFI) 780 and 800nm Highly-Dispersive Ultrafast Mirrors

UltraFast Innovations (UFI) 780 and 800nm Highly-Dispersive Ultrafast Mirrors feature an optimized multilayer ultrafast chirped coating based on dispersive optical interference that provides a low group delay dispersion (GDD) and high reflectance. These ultrafast mirrors provide GDDs as low as -1300fs² and greater than 99.8% reflectivity for p-polarization. The highly-dispersive design of these ultrafast mirrors offers control of third and higher order dispersions, and provides high beam stability at either 5° or 20° angle of incidence. UltraFast Innovations (UFI) 780 and 800nm Highly-Dispersive Ultrafast Mirrors are ideal for pulse compression and dispersion compensation of ultrafast pulses, such as Ti:sapphire lasers. Standard imperial sizes are available, featuring fused silica substrates.